The system is an X-ray Photoemission Spectrometer (XPS, ESCA) enabling elemental concentrations, chemical state identification and chemical state mapping of the surface. The system contains a dual anode (Mg and Al Kα source) and a monochromated Al Kα source. The analysis area varies from 110 μm down to 15 μm, and he ultimate lateral resolution is 5 μm. There is also an He-source enabling Ultraviolet Photoemission Spectroscopy (UPS). Ar Gas Cluster Ion Source (GCIS) capable of generating Ar cluster size up to 2000 atoms. The cluster source enables depth profiling of both hard and soft materials. The ion source also enables Low Energy Ion Scattering Spectrocopy (LEISS).