The Low Temperature Laboratory (LTL), founded in 1965 by Academician Olli V. Lounasmaa, is one of the world centres in ultra low temperature physics and technology. The leading position is based on vigorous in-house development and construction of sub-mK refrigerators. In 2000 the laboratory reached the present low temperature world record of 0.000 000 000 1 K. Scientific and technical staff of LTL has in-depth expertise in cryogenic techniques, development of cryogenic equipment and thermal control systems. LTL has advanced sub Kelvin refrigeration facilities: 3 sub-mK (unique rotating cryostat, world record stationary cryostat and dry demagnetization cryostat) and more than 15 dilution refrigerators aimed for different type of experiments.

   The Low Temperature Laboratory is administered by the Department of Applied Physics. It is part of the national Otaniemi Research Infrastructure fo Micro- and Nanotechnologies, OtaNano and partner in the European Microkelvin Platform.

    In order to get access to the LTL equipment a new user should pass safety course, basic training course and be instructed about LTL facilities. The safety and training courses are arranged by demand. Contact LTL responsible person for details. Equipment training and equipment specific instructions are usually given by the person responsible for the installation/equipment.

CRYOGENIC RESEARCH FACILITIES (2 pcs)

  In the range of temperatures down to 1.2 K, LTL has lots of cryostats with different measurement capabilities, ranging from simple DC electrical measurements to involved microwave measurements for noise, cross-correlations, magnetic properties, and vibrations in NEMS resonators.

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DILUTION REFRIGERATORS (21 pcs)

  The three nuclear demagnetization cryostats of LTL are specialized pieces of equipment which are the flagships of LTL in the Microkelvin research. Different dilution refrigerators (both dry and liquid He based) provide the backbone of the low temperature nanophysics research in LTL.

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MICRO- AND NANOFABRICATION AND TESTING FACILITIES (12 pcs)

The facilities include a production line for e-beam lithography down to 100 nm resolution, operated in a semi-clean-room environment. The fabrication facilities include equipment for heat treatment, critical point drying, and annealing in order to guarantee the best quality of samples before cool down to mK temperatures.

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