UHV electron beam evaporation system for thin film deposition with sample oxidation and ion-beam milling options.
• Permanent Crucibles: Titanium, Aluminium, Gold • Typical base pressure: < 2 * 10^−10 mbar • Typical operation pressure: < 5 * 10^−8 mbar • Disallowed materials: organics, magnetic materials, high vapour pressure metals • Options: Sample oxidation, ion-beam milling
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