UHV electron beam evaporation system for thin film deposition with sample oxidation and ion-beam milling options.

•  Permanent Crucibles: Titanium, Aluminium, Gold
•  Typical base pressure: < 2 * 10^−10 mbar
•  Typical operation pressure: < 5 * 10^−8 mbar
•  Disallowed materials: organics, magnetic materials, high vapour pressure metals
•  Options: Sample oxidation, ion-beam milling