The facilities include a production line for e-beam lithography down to 100 nm resolution, operated in a semi-clean-room environment. The fabrication facilities include equipment for heat treatment, critical point drying, and annealing in order to guarantee the best quality of samples before cool down to mK temperatures.
| Wire Bonder |
| Capacity: 1 persons |
Status: Available |
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| CVD Reactor |
| Capacity: 1 persons |
Status: Available |
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| E-Beam Evaporator |
| Capacity: 1 persons |
Status: Available |
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| LTL Cleanroom |
| Capacity: 15 persons |
Status: Available |
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| Electronics Workshop |
| Capacity: 2 persons |
Status: Available |
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| Micro RAMAN |
| Capacity: 1 persons |
Status: Available |
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| IR heating system MILA-5000 |
| Capacity: 1 persons |
Status: Available |
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| NanoETCH |
| Capacity: 1 persons |
Status: Available |
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| Probe Station |
| Capacity: 1 persons |
Status: Available |
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| SEM and E-beam lithography |
| Capacity: 1 persons |
Status: Available |
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| Transfer and Stamping Setup |
| Capacity: 1 persons |
Status: Available |
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