MICRO- AND NANOFABRICATION AND TESTING FACILITIES

The facilities include a production line for e-beam lithography down to 100 nm resolution, operated in a semi-clean-room environment. The fabrication facilities include equipment for heat treatment, critical point drying, and annealing in order to guarantee the best quality of samples before cool down to mK temperatures.

Wire Bonder
Capacity: 1 persons
Status: Available
CVD Reactor
Capacity: 1 persons
Status: Available
E-Beam Evaporator
Capacity: 1 persons
Status: Available
LTL Cleanroom
Capacity: 15 persons
Status: Available
Micro RAMAN
Capacity: 1 persons
Status: Available
IR heating system MILA-5000
Capacity: 1 persons
Status: Available
NanoETCH
Capacity: 1 persons
Status: Available
Probe Station
Capacity: 1 persons
Status: Available
SEM and E-beam lithography
Capacity: 1 persons
Status: Available
Transfer and Stamping Setup
Capacity: 1 persons
Status: Available