The facilities include a production line for e-beam lithography down to 100 nm resolution, operated in a semi-clean-room environment. The fabrication facilities include equipment for heat treatment, critical point drying, and annealing in order to guarantee the best quality of samples before cool down to mK temperatures.
Wire Bonder |
Capacity: 1 persons |
Status: Available |
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CVD Reactor |
Capacity: 1 persons |
Status: Available |
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E-Beam Evaporator |
Capacity: 1 persons |
Status: Available |
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LTL Cleanroom |
Capacity: 15 persons |
Status: Available |
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Electronics Workshop |
Capacity: 2 persons |
Status: Available |
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Micro RAMAN |
Capacity: 1 persons |
Status: Available |
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IR heating system MILA-5000 |
Capacity: 1 persons |
Status: Available |
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NanoETCH |
Capacity: 1 persons |
Status: Available |
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Probe Station |
Capacity: 1 persons |
Status: Available |
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SEM and E-beam lithography |
Capacity: 1 persons |
Status: Available |
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Transfer and Stamping Setup |
Capacity: 1 persons |
Status: Available |
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