Commercial pulsed laser deposition system with KrF excimer laser. The system is semi-automatic and allows for scripting of the process. The growth can be performed in a controlled atmosphere and the targets can be switched throughout the process. The sample is heated from a backside of the sample holder by an IR laser. The chamber has a high pressure RHEED system for growth monitoring.

Basic manual here: Manual

Targets available: Targets

Chamber/gasses/targets

Base pressure: 2e-8mbar

Pressure range: vacuum - 100mBar

Connected gasses: N, O, Ar

Number of targets: 5

Deposition laser:

Maximum fluence: 2.8 J/cm

Wavelength: 248 nm

Pulse width: 20ns

Sample holder:

Temperature range: RT or 260-1000degC

Flag style sample holder

Sample size: 5x5-10x10 mm (max t is 1 mm)