Pulsed Laser Deposition (PLD) is a thin film deposition technique used to create thin films of various materials. In PLD, a high-energy pulsed laser beam is focused onto a target material in a vacuum chamber. The laser pulse ablates or vaporizes the target material, creating a plume of particles that then condense onto a substrate, forming a thin film with the same composition as the target. This method allows for precise control over film thickness and the deposition of complex materials, including oxides and compounds.
Pulsed laser deposition system - PHYS NanoSpin |
Capacity: 1 persons |
Status: Available |
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