It is a flow type hot-wall ALD reactor (F-120 by ASM Microchemistry Ltd.). The pressure limit is 3−4 mbar. Mainly used for the deposition of oxides, hybrids, laminates or superlattice structures. Any type of reactants (solid, liquid or gas) can be employed. The reactants should have sufficient vapor pressure for the efficient transport of the precursor to the substrate. The deposition temperature range can be between 50 and 400ºC. Maximum substrate size is 5 X 5 cm². 3D objects can also be used for deposition. Conformal deposition is possible.