It is also a flow type hot-wall ALD reactor (F-120 by ASM Microchemistry Ltd.). Reactant used should be in powder form. The pressure limit is 3−4 mbar. Mainly used for the deposition of oxides, hybrids, laminates or superlattice structures. The reactants should have sufficient vapor pressure for the efficient transport of the precursor to the substrate. The deposition temperature range can be between 50 and 400ºC.
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