Mainly used for the deposition of oxides, hybrids, laminates or superlattice structures. Substrate used for deposition can have a higher dimension as compared to F reactors (50-200 mm single wafers or 156 mm x 156 mm solar Si wafers). 3D objects and powders can be also used for deposition. Any type of reactants (solid, liquid or gas) can be used. The deposition temperature range can be between 50 and 500ºC