Spectroscopic ellipsometry is a non-destructive, noncontact, and non-invasive optical technique which is based on the change in the polarization state of light as it is reflected obliquely from a thin film sample. Ellipsometry uses a model based approach to determine thin film, interface, and surface roughness thicknesses, as well as optical properties (and much more!) for thin films ranging in thickness from a few A to several tens of microns.

Also, spectroscopic ellipsometry can be performed either ex-situ or in-situ, in static or kinetic mode, for various application needs.

Spectroscopic ellipsometry measures ψ and Δ, both of which describe the output elliptical polarization state after linearly polarized light is reflected obliquely off of a thin film sample.

The parameters ψ and Δ are related to the complex Fresnel reflection coefficients according to: ρ = tan ψ eiΔ = rp / rs. After collecting ψ and Δ, a model representing the thin film structure must be built in order to determine thickness and/or optical constants

• Large spectral range: 190-2100 nm
• Thin film thickness from 1Å to 50 µm
• Surface and interface roughness
• Optical constants (n,k) for isotropic, anisotropic and graded films
• Derived optical data such as: absorption coefficient α, optical bandgap Eg
• Material properties: compound alloy composition, porosity, crystallinity, morphology

Configuration

• Spot size: 0.05 - 0.1 - 1 mm (pinhole)
• Sample stage: 150 mm, manual height (20mm) and tilt adjustment
• Automatic goniometer: Automatically adjustable angle from 45° to 90° by step of 0.01°
• Small liquid cell, electrochemical cell available