X-ray photoelectron spectrometry (XPS) is an analytical technique used to determine the elemental composition and chemical state of a material's surface. It involves bombarding the sample with X-rays, which cause the emission of photoelectrons from the surface. By measuring the kinetic energy and intensity of these emitted photoelectrons, XPS can identify the elements present and provide information about their chemical environments. This technique is widely utilized in materials science, surface chemistry, and semiconductor industry for surface analysis, quality control, and characterization of thin films and coatings.

Kratos Analytical AXIS Ultra, with DLD detector
Capacity: 1 persons
Status: Available